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CVP21 with footprint 60(W)*80(D)*195(H)cm,
to minimize space requirements in clean room. r
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CVP21 is the COMPLETE SOLUTION: CVP21 supports the COMPLETE spectrum of materials: r
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Group IV semiconductors as Silicon (Si), Germanium (Ge), Silicon Carbide (SiC), or r
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III-V semiconductors as Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), ..., or r
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ternary III-V alloys as Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminium Indium Arsenide (AlInAs) ..., or r
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quaternary III-V alloys as Aluminum Gallium Indium Phosphide (AlGaInP), ..., or r
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Nitrides, as Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN) or Aluminum Indium Nitride (AlInN), or r
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II-VI semiconductors as Zinc Oxide (ZnO), Cadmium Telluride (CdTe), Mercury Cadmium Telluride (HgCdTe, MCT)..., or r
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less commonly used semiconductors (please contact us for sample measurements). r
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CVP21 supports the COMPLETE sample range: r
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Stacked layers are no problem (the material, the doping and the doping type may vary). r
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No Restrictions concerning the substrate (may be conductive or insulating). r
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Sample size: 4*2 mm?to complete 8" wafer size are standard (smaller samples on request). r
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CVP21 supports the COMPLETE resolution range: r
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(*) may depend on material type/ sample quality. Please ask for sample measurements r
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CVP21 comes as a COMPLETE measurement system: r
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High Reliability system (special concern on electronics, mechanics, optics and fluid system). r
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Calibration-free system (Complete self calibrating electronic system - no needs for cable capacitance calibration). r
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Easy-to-use (Software optimized with full user management - easily used as well in production as in laboratory environment). r
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Wafer-Stepping (Complete wafer stepper is optionally available - to process several measurements on a wafer in full automation). r
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Camera-Control (The process is controlled on-line by a color camera - after each measurement camera data is available in film strip format). r
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Recipes (Measurement recipes are pre-defined and may easily modified by a user with higher priority). r
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Dry-In / Dry-Out: Auto-Load / Unload / Reload (The loading/ un-loading and re-loading of the electrochemical cell is automated and may be easily modified by a user with higher priority. The samples are processed dry-in / dry-out). r
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