Designed with the focus on high performance at an affordable price, the ??G 501 is the perfect solution for prototyping such as MEMS, Integrated Optics, Micro Fluidics, Lab-on-a-Chip devices and Photomask fabrication. The ??G 501 offers two optional configurations. With WM-I it is possible to write structures down to 1 ?? at a speed of 50 mm??min. In WM-II you can produce features down to 2 ?? with a speed of 100 mm??min. This equals an exposure time of less than 25 min. for a 2“ x 2“ pattern. The integrated exposure wizard (GUI) guides the operator through the complete procedure: Load the substrate, select the design and start the exposure. With a footprint of 60 x 75 cm??the ??G 501 was designed to fit even into the smallest R&D laboratories, and requires only power connection and an air pressure supply to operate.
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Applications for the ??G 501 include Life Science, MEMS, Micro-Opics, Semiconductor, Sensors, Actuators, MOEMS, Material Research, Nano-Tubes, Graphene, and any other application that requires microstructures.
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For additional information please download the Fact Sheet or contact us.
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Key Features
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rn- Write speed up to 100 mm?? min rn
- Substrates up to 6" x 6" rn
- Structures down to 1 ?? rn
- High power LED light source rn
- SLM based light engine rn
- Multiple data input formats rn
- Basic gray scale exposure mode rn
- Camera system for alignment rn
- Metrology rn
- Realtime autofocus rn
- User-optimized exposure wizard
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