In addition to high-resolution 2D patterns systems provide a special exposure mode, known as Gray Scale lithography, to create complex 3D structures in thick photoresist. In contrary to other technologies this method enables high throughput formation of 3D microstructures over large areas. Special software tools for optimization and evaluation of Gray Scale exposures have been developed to reduce the cycle time for new products. To ensure lowest surface roughness and shape conformity the systems support up to 4096 gray levels, an unmatched capability in the current market. Most common applications include fabrication of wafer level optics used for telecommunication or illumination market segments where our systems are being used by some of the largest multinational corporations. Other new applications include display manufacturing as well as device fabrication in the areas of biology and life sciences.
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nnnnKey Features
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- Substrates up to 400 x 400 mm??/span> n n
- Structures down to 0.6 ?? n n
- Address grid down to 5 nm n n
- Multiple write modes n n
- Advanced 3D exposure mode n n
- Multiple data input formats(DXF, CIF, GDSII, Gerber, STL, BMP) n n
- Climate chamber n
- Optical and air-gauge auto focus n n
- Scripting capability n n
- Online data transfer n n
- Stage map correction n n
- Camera system for alignment n n
- Automatic loading system n n
- Customer specific laser n
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